Research Fellow (EUV Nanophotonics & Nanopatterning) at Nanyang Technological University in NTU Main Campus

  • Company: Nanyang Technological University
  • Location: NTU Main Campus, Singapore
  • Job type: full time
  • Workplace: onsite
  • Posted: 2026-10-14

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Job description

School of Electrical and Electronic Engineering is one of the founding Schools of the Nanyang Technological University. Built on a culture of excellence, the School is renowned for its high academic standards and research. With over 3,000 undergraduates students and 2,000 graduate students it is one of the largest EEE schools in the world and ranks 4th in the field of Electrical & Electronic Engineering in the 2025 QS World University Rankings by Subjects. Today, the School has become one of the world’s largest engineering schools that nurtures competent engineers and researchers. Each year, the School graduates over a thousand students who are ready to take on great ambitions and challenges. The position will be based at LUMINOUS! Centre of Excellence for Semiconductor Lighting and Displays, a leading research centre under EEE. LUMINOUS! focuses on semiconductor device research, fabrication, and applications in next-generation lighting, displays, and electronics. With state-of-the-art cleanroom and characterization facilities, the centre brings together interdisciplinary expertise in materials science, device engineering, and system integration to address key challenges in energy-efficient and sustainable technologies. For more details, please view: https://www.ntu.edu.sg/eee The LUMINOUS! Centre of Excellence for Semiconductor Lighting and Displays at NTU is seeking a Research Fellow in EUV Nanophotonics and Nanopatterning to join the NRF Competitive Research Programme project, “Extreme UV Nanophotonics: Quantum Control and Meta-Optical Design of Extreme Ultraviolet Light Sources.” In this role, you will turn theory into practical technology by fabricating chip-scale, free-electron-driven EUV sources and approximately 10 nm electron-beam-lithography masks. You will integrate these devices with advanced vacuum and electron-optical systems to achieve high-brightness emission at short wavelengths. You will lead the first proof-of-concept demonstration of EUV nanopatterning using a chip-scale source, strengthening NTU’s leadership in EUV nanophotonics and opening new possibilities for semiconductor lithography and metrology. Key Responsibilities: Experimental Platform Development: Lead the design and assembly of high-vacuum and ultra-high vacuum (UHV) systems, custom vacuum chambers and optical setups tailored for free-electron–light interaction and EUV generation. Chip-Scale Source Development: Lead the development, fabrication, and integration of chip-scale EUV emitter components, including cathode nanostructures (e.g., ZnO, graphene, carbon nanotubes) and Si/Mo multilayer anode structures, using sputtering, chemical vapor deposition (CVD), and high-vacuum bonding/sealing techniques. EUV Nanopatterning Masks: Design and fabricate EUV nanopatterning masks (Si3N4 membrane on Si substrate) using electron-beam lithography and metal dry-etching processes to achieve nanopattern feature sizes of approximately 10 nm. Beam and Device Characterization: Implement and optimize electron-optical systems and diagnostic tools, including cold cathode field emission testing, to characterize electron beam properties, beam-matter interactions at the nanoscale, and device performance. EUV Metrology: Oversee the detection and spectral analysis of EUV radiation, ensuring high-fidelity measurements of brightness and coherence. Hardware Integration and Packaging: Collaborate with theorists and fabrication experts to integrate functional nanostructures (e.g., cathode/anode structures, multilayer waveguides, and nanopatterned masks) into experimental vacuum environments and perform the alignment and packaging of EUV-emitting chip-scale devices and masks. Proof-of-Concept Demonstrations: Conduct proof-of-concept demonstrations of EUV nanopatterning with sub-10 nm alignment precision and support the scaling of single-chip devices into multi-chip arrays for higher power output. Laboratory Leadership: Manage experimental workflows, oversee laboratory and cl

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